Tutorial


The CMP community has been grown significantly last 10 years and needs a CMP tutorial program which not only updates recent issues in CMP technology but also provides the future direction. The tutorial program is to connect CMP community and to stimulate the ideas and collaboration among endusers, vendors and research institutes. The tutorial program will ever change as the technology and trend change. We invited best possible speakers from all over the world. You will enjoy the content and quality of CMP technology.

  1. Date: Sep. 15, 2019
  2. Venue: Ballroom D, 11th Floor, Ambassador Hotel, Hsinchu, Taiwan
  3. Tutorial Fee
    Student Rate : Early bird TWD 3000 (USD 100), Regular TWD 4500 (USD 150)
    Full Rate : Early bird TWD 6000 (USD 200), Regular TWD 9000 (USD 300)
  4. Tutorial fee includes tutorial printouts, coffee breaks and lunch box.

ICPT2019 Tutorial Program     PDF

Time Topic Area / Speaker Session Host
08:50 am
|
09:00 am
Opening remarks
Tutorial Chair
Dr. Jin-Goo Park/Professor,
Hanyang University,
Dept. of Materials Science and Chemical Engineering, Korea
09:00 am
|
10:00 am
CMP fundamental and overview of CMP processes with history and HVM challenges
Dr. Wei-Tsu Tseng
IBM, USA
10:00 am – 10:15 am Coffee break
10:15 am
|
11:15 am
Electro chemical reaction from TSMC
Dr. Jeng-Shin Ma
TSMC, Taiwan
Dr. Scott A. Lawing,
Technology Director,
Kinik North America
11:15 am
|
12:15 pm
CMP Slurry Overview: particles to slurry formulation, technology and trend
Dr. Seiichi Kondo
Hitachi Chemical, Japan
12:15 pm – 01:30 pm Lunch
01:30 pm
|
02:30 pm
CMP Pad and conditioner Overview: Technology evolution and their trend
Dr. Scott A. Lawing
KINIK, Taiwan
Dr. Wei-Tsu Tseng
Unit Process: CMP
IBM Semiconductor Technology Research NY, USA
02:30 pm
|
03:30 pm
CMP in line monitoring of process and consumable
Dr. Yi-Sha Ku
ITRI, Taiwan
03:30 pm – 03:45 pm Coffee break
03:45 pm
|
04:45 pm
Post CMP cleaning, technology evolution, and its trend
Dr. Paul Bernatis
EKC DuPont, USA
Sr. Consultant,
Innoever Corp
Tutorial Program Principal Planner
04:45 pm
|
05:45 pm
CMP Application to MEMS, Technology evolution, issues and trend
Dr. Gerfried Zwicker,
Zwickerconsult, Germany
05:45 pm
|
05:55 pm
Concluding remarks
Dr. Chao Chang (Arthur) Chen,
ICPT 2019 Conference Chair
ICPT2019 reserves the right to modify the program without prior notice.




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